We are seeking a highly motivated OPC Engineer. The engineer will be responsible for developing, implementing, and optimizing Optical Proximity Correction (OPC) solutions to improve lithographic printability and ensure compliance with advanced process node requirements. The role involves close collaboration with Design, Process Integration, Lithography, Mask Engineering, and Foundry teams to achieve manufacturing yield and pattern fidelity goals.
Key Responsibilities:
Perform Model-Based OPC (MBOPC) and Rule-Based OPC (RBOPC) for advanced technology nodes.Generate and validate OPC recipes for critical semiconductor layers.
Conduct lithography simulations and analyze pattern fidelity across process windows.
Execute Process Window Qualification (PWQ) and hotspot analysis.Perform OPC verification and lithography checking using industry-standard EDA tools.
Collaborate with Process and Foundry teams to understand lithographic challenges and develop corrective solutions.
Analyze mask manufacturability issues and recommend improvements.
Support RET (Resolution Enhancement Techniques) development including:Sub-Resolution Assist Features (SRAF)Source Mask Optimization (SMO)Inverse Lithography Technology (ILT)Phase Shift Mask (PSM)Drive continuous improvement of OPC methodologies and automation workflows.
Debug and resolve mask-related yield and manufacturability issues.
Document methodologies, best practices, and technical reports.
Master's or PhD degree in:
Electronics Engineering
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2-10 Years (can be adjusted based on hiring level)
Strong understanding of:
Semiconductor manufacturing processes
Optical lithography
Mask synthesis and mask data preparation
Process window concepts
Computational lithography
Required Technical Skills:
Experience with OPC and RET tools from:
Synopsys Proteus
Siemens Calibre OPC
ASML Brion solutions
Equivalent computational lithography tools
Knowledge of:
DRC/LVS methodologies
Pattern matching and hotspot detection
Mask Rule Checking (MRC)
Yield enhancement techniques
Scripting experience in:
Python
Tcl
Shell scripting
Preferred Qualifications:
Understanding of computational lithography and process modeling.
Exposure to machine learning applications in OPC and hotspot detection.
Familiarity with semiconductor foundry design rules and tapeout processes.
Job Summary:
We are seeking a highly motivated OPC Engineer. The engineer will be responsible for developing, implementing, and optimizing Optical Proximity Correction (OPC) solutions to improve lithographic printability and ensure compliance with advanced process node requirements. The role involves close collaboration with Design, Process Integration, Lithography, Mask Engineering, and Foundry teams to achieve manufacturing yield and pattern fidelity goals.
Key Responsibilities:
Perform Model-Based OPC (MBOPC) and Rule-Based OPC (RBOPC) for advanced technology nodes.Generate and validate OPC recipes for critical semiconductor layers.
Conduct lithography simulations and analyze pattern fidelity across process windows.
Execute Process Window Qualification (PWQ) and hotspot analysis.Perform OPC verification and lithography checking using industry-standard EDA tools.
Collaborate with Process and Foundry teams to understand lithographic challenges and develop corrective solutions.
Analyze mask manufacturability issues and recommend improvements.
Support RET (Resolution Enhancement Techniques) development including:Sub-Resolution Assist Features (SRAF)Source Mask Optimization (SMO)Inverse Lithography Technology (ILT)Phase Shift Mask (PSM)Drive continuous improvement of OPC methodologies and automation workflows.
Debug and resolve mask-related yield and manufacturability issues.
Document methodologies, best practices, and technical reports.
Master's or PhD degree in:
Electronics Engineering
Electrical Engineering
Semiconductor Technology
Physics
Microelectronics
Related disciplines
Experience:
2-10 Years (can be adjusted based on hiring level)
Strong understanding of:
Semiconductor manufacturing processes
Optical lithography
Mask synthesis and mask data preparation
Process window concepts
Computational lithography
Required Technical Skills:
Experience with OPC and RET tools from:
Synopsys Proteus
Siemens Calibre OPC
ASML Brion solutions
Equivalent computational lithography tools
Knowledge of:
DRC/LVS methodologies
Pattern matching and hotspot detection
Mask Rule Checking (MRC)
Yield enhancement techniques
Scripting experience in:
Python
Tcl
Shell scripting
Preferred Qualifications:
Understanding of computational lithography and process modeling.
Exposure to machine learning applications in OPC and hotspot detection.
Familiarity with semiconductor foundry design rules and tapeout processes.
